Wisconsin Discovery Portal

Researcher: Paul Nealey

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Areas of Research Expertise
* Resist materials for advanced lithography
* Analysis, design and synthesis of resist materials for advanced lithography
* Development of ultra-thin imaging layers
* Theoretical and experimental analysis of the thermal and mechanical properties of polymer structures as a function of their dimensions
* Quantification, modeling and prevention of collapse of resists structures due to surface tension
* Outgassing and photochemical reaction mechanisms of resists in EUV lithography
* Self-assembly of thin films of block copolymers on chemically heterogeneous surfaces
* Use of self-assembled monolayers (SAMs) as boundary lubricants
* Control of the adhesion and friction between surfaces immersed in solvent is crucial in processes such as fluidic self assembly (FSA)and in microelectromechanical systems (MEMS)
* Effect of nanostructured surfaces on cell behavior
Web Site Paul Nealey's University Web Page
Curriculum Vitae (CV)
Current/Active Funding
  • NIH, 2007-2012, Towards a Synthetic Basement Membrane for the Corneal Epithelium
  • NSF, 2009-2014, NSEC on Templated Synthesis and Analysis at the Nanoscale
  • WARF, 2008-3033, Litigation Expense - Intel Funding Gap
  • Wisconsin Alumni Research Foundation, 2009-2014, RA support for the Nanoscale Science and Engineering Center (NSEC) as match for NSF award
  • Hitachi Global Storage Technologies, 2010-2012, Joint Study Agreement
  • UES, 2011-2012, Top-down Meets Bottom-up for Optical Metamaterials: Directed Assembly of Plasmonic Nanoparticles on Polymer-Derived Surface Patterns
  • Semiconductor Research Corporation, 2011-2012, UW Program in the Directed Assembly of Block Copolymers for Lithographic Applications
  • WARF, 2011-2012, NSEC on Templated Synthesis and Assembly at the Nanoscale Matching Request
Issued Patent(s)
  • 7,851,252 - Materials and methods for creating imaging layers, granted Dec 2010.
  • 7,807,348 - Optical imaging of nanostructured substrates, granted Oct 2010. 
  • 7,514,764 - Materials and methods for creating imaging layers, granted Apr 2009.
  • 7,326,514 - Organoelement resists for EUV lithography and methods of making the same, granted Feb 2008.
  • 7,141,176 - Methods and apparatuses for assembling elements onto a substrate, granted Nov 2006.
USPTO Published Applications
  • 20090260750 - Molecular transfer printing using block copolymers, Oct 2009.
  • 20090087664 - Directed assembly of triblock copolymers, published Apr 2009.
  • 20090087653 - Fabrication of complex three-dimensional structures based on directed assembly of self-assmebly materials on activated two-dimensional templates, published Apr 2009.
  • 20080299353 - Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials, published Dec 2008.
  • 20080187995 - Use of topographic cues to modulate stem cell behaviors, published Aug 2008.
Recent Publication(s)
  • "Three-dimensional Directed Assembly of Block Copolymers together with Two-dimensional Square and Rectangular Nanolithography"

Ji SX, Nagpal U, Liao W, Advanced Materials 23(32): 3692 Aug 2011. Self-assembling sphere-forming block copolymers that normally adopt a hexagonal packing in thin films are directed to assemble on chemically patterned surfaces into their three-dimensional bulk-like body-centered cubic morphology.

  • "Anomalous transitions of DODAB using fast scanning liquid calorimetry"

Hu L, Efremov MY, Olson EA, et al., Thermochimica Acta 522(1-2): 72-76 Aug 2011. Anomalous melting transitions are observed on dimethyl dioctadecyl ammonium bromide (DODAB) using a fast-scanning liquid calorimeter.

  • "Site-Specific Placement of Au Nanoparticles on Chemical Nanopatterns Prepared by Molecular Transfer Printing Using Block-Copolymer Films"

Onses MS, Thode CJ, Liu CC, et al., Advanced Functional Materials 21(16): 3074-3082 Aug 2011. Here, site-specific localization of Au NPs onto nanoscale chemical patterns of polymer brushes is investigated.

  • "Pattern Dimensions and Feature Shapes of Ternary Blends of Block Copolymer and Low Molecular Weight Homopolymers Directed To Assemble on Chemically Nanopatterned Surfaces"

Nagpal U, Kang HM, Craig GSW, ACS Nano 5(7): 5673-5682 Jul 2011. Ternary blends of cylinder-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) and low molecular weight PS and PMMA were directed to assemble on chemically patterned surfaces with hexagonal symmetry.

Recent Artistic Works  
Collaboration
  • Intra-University Collaboration: Materials Research Science and Engineering Center, Biomedical Engineering Center for Translational Research
  • Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut
  • Princeton University, Molecular Biology
Research Tools

 

Research Facilities
  • UW Center for NanoTechnology (CNTech)
  • Biotechnology Center
  • Kegonsa Research Campus
  • Rheology Research Center
E-mail Address [email protected]
Phone Number (608) 265-8171
Current University UW- Madison
Department Chemical and Biological Engineering
Title Professor
Other Appointments
Principal Investigator, Nealey Research Group
Associate Director, Center for NanoTechnology (CNTech)
Faculty, Materials Science Graduate Program
Address Line 1 3020 Engineering Hall
Address Line 2 1415 Engineering Drive
City Madison
State WI
Zip Code 53706
Bachelor's Degree BS, Rice University
Master's Degree
PhD PhD, Massachusetts Institute of Technology
Other Degrees
Technologies Available for Licensing