|Areas of Research Expertise||
* Resist materials for advanced lithography
* Analysis, design and synthesis of resist materials for advanced lithography
* Development of ultra-thin imaging layers
* Theoretical and experimental analysis of the thermal and mechanical properties of polymer structures as a function of their dimensions
* Quantification, modeling and prevention of collapse of resists structures due to surface tension
* Outgassing and photochemical reaction mechanisms of resists in EUV lithography
* Self-assembly of thin films of block copolymers on chemically heterogeneous surfaces
* Use of self-assembled monolayers (SAMs) as boundary lubricants
* Control of the adhesion and friction between surfaces immersed in solvent is crucial in processes such as fluidic self assembly (FSA)and in microelectromechanical systems (MEMS)
* Effect of nanostructured surfaces on cell behavior
|Web Site||Paul Nealey's University Web Page|
|Curriculum Vitae (CV)|
|USPTO Published Applications||
Ji SX, Nagpal U, Liao W, Advanced Materials 23(32): 3692 Aug 2011. Self-assembling sphere-forming block copolymers that normally adopt a hexagonal packing in thin films are directed to assemble on chemically patterned surfaces into their three-dimensional bulk-like body-centered cubic morphology.
Hu L, Efremov MY, Olson EA, et al., Thermochimica Acta 522(1-2): 72-76 Aug 2011. Anomalous melting transitions are observed on dimethyl dioctadecyl ammonium bromide (DODAB) using a fast-scanning liquid calorimeter.
Onses MS, Thode CJ, Liu CC, et al., Advanced Functional Materials 21(16): 3074-3082 Aug 2011. Here, site-specific localization of Au NPs onto nanoscale chemical patterns of polymer brushes is investigated.
Nagpal U, Kang HM, Craig GSW, ACS Nano 5(7): 5673-5682 Jul 2011. Ternary blends of cylinder-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) and low molecular weight PS and PMMA were directed to assemble on chemically patterned surfaces with hexagonal symmetry.
|Recent Artistic Works|
|E-mail Address||[email protected]|
|Phone Number||(608) 265-8171|
|Current University||UW- Madison|
|Department||Chemical and Biological Engineering|
Principal Investigator, Nealey Research Group
Associate Director, Center for NanoTechnology (CNTech)
Faculty, Materials Science Graduate Program
|Address Line 1||3020 Engineering Hall|
|Address Line 2||1415 Engineering Drive|
|Bachelor's Degree||BS, Rice University|
|PhD||PhD, Massachusetts Institute of Technology|
|Technologies Available for Licensing|